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Bruker Introduces New AFM Semiconductor Characterization Solution

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By Business Wirevia The Motley Fool

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Bruker Introduces New AFM Semiconductor Characterization Solution

Highest Resolution Carrier Profiling Capability Confirmed by Imec

SANTA BARBARA, Calif.–(BUSINESS WIRE)– Bruker announced today the release of the Dimension Icon® SSRM-HR, a new atomic force microscope (AFM) configuration including the Scanning Spreading Resistance Microscopy (SSRM) module, designed specifically for high-resolution (HR) semiconductor characterization. Integrating Bruker‘s industry-leading Dimension Icon AFM platform with an environmental control system capable of 1ppm gas purity and high-vacuum control, the Dimension Icon SSRM-HR system provides vastly improved repeatability and spatial resolution in semiconductor carrier profiling. As confirmed by Imec (www.imec.be), buried gate oxide layers as thin as 5Å are detected routinely.

Dimension Icon SSRM-HR (Photo: Business Wire)

“As our customers continue to improve their products to follow the semiconductor roadmap, higher spatial resolution electrical characterization is a key requirement,” said David V. Rossi, Executive Vice President and General Manager of Bruker’s AFM Business. “The new Dimension Icon SSRM-HR combines the leading productivity and large programmable stage of our top performance AFM platform with atomic resolution, and the most accurate carrier profiling optimization to meet the specific demands of next-generation technology nodes.”

“We chose Bruker because they offer the only solution that meets our needs,” added Prof. Vandervorst, Imec Fellow and Department Head, Materials and Components Analysis, based in Leuven, Belgium. “Our decision followed a rigorous evaluation of spatial resolution and repeatability in carrier profiling. Being at the forefront in tackling the roadblocks to continued technology scaling means we have the most stringent requirements.”

About Dimension Icon SSRM-HR

Dimension Icon SSRM-HR constitutes a new AFM configuration that integrates the large stage, low drift, and finest force control of the Dimension Icon platform with the Scanning Spreading Resistance Microscopy (SSRM) application module, SSRM-DIA probes, and high-end environmental control. Following seamless sample transfer from a high vacuum sample preparation chamber, oxygen and water are controlled at the 1ppm level during AFM imaging. The environmental control system is compatible with all released Dimension Icon accessories and application modules, further extending its benefits to additional applications.

About Bruker Corporation

Bruker Corporation (NAS: <a target=_blank class="tmf-ticker …read more

Source: FULL ARTICLE at DailyFinance

Business, Finance, Occupation & Industry

Tenneco Supplying Emission Control Technologies on 2014 Chevrolet Corvette Stingray

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By Business Wirevia The Motley Fool

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Tenneco Supplying Emission Control Technologies on 2014 Chevrolet Corvette Stingray


Company helps create Corvette’s signature sound for next-generation sportscar

LAKE FOREST, Ill.–(BUSINESS WIRE)– Tenneco (NYS: TEN) announced it is supplying key emission control technologies, including electrical valves, for the 2014 Chevrolet Corvette Stingray, one of the most highly anticipated vehicles debuting in 2013. Considered one of the key performance features of the car, the Corvette’s exhaust system delivers a unique signature sound.

Most notably, the Corvette’s standard exhaust system is the first vehicle to utilize Tenneco’s electrical valve technology for sound tuning. The electric valves are designed to work in concert with the vehicle’s Active Fuel Management (AFM) system, a fuel-saving four-cylinder mode versus eight-cylinder mode. The valves open and close to control the Corvette’s exhaust sound as it switches between the two engine modes.

In addition to the valves highlighted in the AFM system, the exhaust system features an option which includes two additional electrical valves in the tailpipes, tuned specifically for enhanced sound quality. These valves remain closed during normal driving conditions and open during harder acceleration, creating lower backpressure, more engine power and most importantly, Corvette’s signature sound.

“The Corvette is one of America’s iconic automobiles, and Tenneco could not be more excited and pleased to partner with Chevrolet to provide a combination of performance attributes, including improved fuel economy, power and the vehicle’s signature sound,” said Tim Jackson, Tenneco’s chief technology officer. “Additionally, the program gives Tenneco an opportunity to demonstrate our advanced exhaust technology on one of the highest performance vehicles available in the market.”

Tenneco is a global supplier to General Motors, providing both ride performance and clean air technologies for GM passenger cars and light and medium-duty trucks.

The company manufactures the electric valves at its Valencia, Spain facility, while the other system components will be produced at its Seward, Nebraska and Elkhart, Indiana facilities. Final assembly of the exhaust system takes place at Tenneco’s Smithville, Tennessee plant. Tenneco’s global emissions technical centers in Edenkoben, Germany and Grass Lake, Michigan provided electric valve engineering and systems integration support.

About Tenneco

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Source: FULL ARTICLE at DailyFinance

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UK National Graphene Institute Selects Bruker's Dimension FastScan AFM

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By Business Wirevia The Motley Fool

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UK National Graphene Institute Selects Bruker’s Dimension FastScan AFM

New Levels of Speed, Ease of Use, and Productivity Enable Next-Generation Applications

SANTA BARBARA, Calif.–(BUSINESS WIRE)– Bruker has established a collaborative partnership with the University of Manchester’s new National Graphene Institute (NGI) to leverage the benchmark speed, resolution and performance of the Dimension FastScan® Atomic Force Microscope (AFM) for research into the nanofabrication and nanoscale properties of graphene.

Graphene, the world’s thinnest, strongest and most conductive material, was first isolated and characterized at The University of Manchester by Professor Andre Geim and Professor Kostya Novoselov, who were awarded the Nobel Prize for Physics in 2010 for their research. This transparent, one-atom thick flat sheet of carbon has the potential to revolutionize technology, from smartphones and ultrafast broadband to drug delivery and computer chips. Bruker’s unique PeakForce TUNATM and PeakForce KPFMTM nanoelectrical AFM modes are anticipated to provide important new insights into nanoscale variations of graphene conductivity and work function. Coupled with simultaneous quantitative mapping of mechanical properties enabled by Bruker’s exclusive PeakForce QNM® AFM mode, NGI researchers hope to uncover new information that will ultimately optimize the performance of new graphene-based materials and devices.

“Bruker’s Dimension FastScan provides our team with the best available technology to support the complex demands for sub-nanometer observations of graphene,” said Nobel Prize winner Professor Novoselov. “The unmatched speed and unique property mapping modes of FastScan will benefit many researchers across our institute and its partners. One of our key goals is to benefit from collaborative partnerships with leading global industry innovators, and we are very much looking forward to partnering with Bruker’s team of AFM innovators and application scientists.”

“It is clear that the world-class research team at The University of Manchester and its National Graphene Institute is a leader in graphene research and we are delighted that they have selected Bruker AFM systems to enable their work,” added David V. Rossi, Executive Vice President and General Manager of Bruker’s AFM Business. “It is also pleasing to see that the Dimension FastScan and Bruker’s new proprietary nanoelectrical AFM modes are being used to accelerate graphene research and its technological applications.”

About Dimension FastScan

The Dimension FastScan system utilizes a revolutionary XYZ closed-loop head that scans at high-speed rates while delivering extremely low drift and low noise to make atomic force microscopy easier …read more
Source: FULL ARTICLE at DailyFinance